铌锆合金坩埚

铌锆合金坩埚产品信息

编号 NB0022
规格 圆柱形、锥形、舟形
材质 R4251 (Nb-1Zr) / R4261 (Nb-1Zr)
纯度 99.9% / 99.95% / 99.99%
表面处理 抛光

描述

产品简介

材质为 RO4261 的铌锆合金坩埚,成分为 99% 高纯铌和 1% 高纯锆。此高性能铌锆坩埚专为冶金、化工、机械加工、玻璃及陶瓷等行业设计制造。我们还可根据客户需求定制不同纯度的产品,满足多样化应用要求。


规格参数

编号 NB0022
形状 圆柱形、锥形、舟形
材质 R4251 (Nb-1Zr) / R4261 (Nb-1Zr)
纯度 99.9% / 99.95% / 99.99%
表面处理 抛光

包装说明

高性能铌锆合金坩埚采用泡沫包裹,并装入胶合板箱内,确保运输和存储过程中的安全和完整。

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常见问题

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.