钼坩埚根据应用场景特殊设计，其密度因用途而异：
烧结应用：密度通常为 9.8-10 g/cm³
锻造应用：密度可达 10.2 g/cm³
支持定制多种形状，包括 椭圆形、锥形、无底式、圆口型 等。
广泛应用于 LED蓝宝石晶体生长、化工、冶金 等领域。苏州科跃提供严格按客户需求定制的钼坩埚产品。
| 状态 | 尺寸范围 (mm) | 公差 (mm) |
|---|---|---|
| 烧结用 | 直径10-500 × 高度10-600 | ±5 |
| 锻造用 | 直径10-130 × 高度10-200 | ±1（直径）/±2（高度） |
基础材料属性
材质：高纯钼（Mo）
外观：银灰色金属光泽
熔点：2617°C
密度：10.28 g/cm³（换算自10280 kg/m³）
特性：表面致密坚硬，需严格脱气处理
凭借对 强酸、熔融玻璃/金属 的优异耐腐蚀性，钼坩埚主要用于：
冶金机械与稀土冶炼
真空热蒸发、核燃料烧结
高端电容器制造
高新技术产业单晶材料制备
采用 防震泡沫+多层胶合板箱 包装，确保运输安全。
Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.
Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.
Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.
Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.
Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.
Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.
Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.
Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.
您可以向我们发送询盘，以获取更多信息和最新价格。
苏州科跃材料科技有限公司是一家专注于高纯材料、薄膜沉积靶材、特种合金及磁性材料研发与生产的高新技术企业。我们提供从高纯金属（3N~6N）、溅射靶材、蒸发材料到特种合金、磁性组件及定制加工的一站式材料解决方案，服务于半导体、新能源、航空航天、科研院所等领域。
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